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| Product Name: |
Rotatable Cylindrical TiO2 Sputtering Target
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| Supply Ability: |
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| Related proudcts |
sputtering target, cylindrical target, |
| Specifications |
Maximum Machining Size L 4000MM T 6-13MM |
| Price Term: |
EXW,FOB,CNF,CIF |
| Port of loading: |
GUANGZHOU |
| Minimum Order |
1pcs |
| Unit Price: |
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Application: Mainly used for producing TiO2 film, widely used in Optical glass AR film, Low-E glass film
Physical and Chemical Properties:
Chemical Composition: TiOx (1.7<x<1.9 )
Resistivity ( 20℃) : ¡Ü 0.3 ¦¸. cm
Molding process: Spray
Purity: ¡Ý4.05 g/cm3( ¡Ý95% )
Density: ¡Ý99.6%
Maximum Impurities content (Unit: ppm, Total Impurities Content ¡Ü 4000ppm)
vicky-chan(at)uvtm.com |
| Company: |
UV Tech Material Ltd.
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| Contact: |
Ms. Vicky Chan |
| Address: |
No.4 Huahui Road, Huashan Town, Huadu |
| Postcode: |
510880 |
| Tel: |
86 20 22968888 |
| Fax: |
86 20 22968899 |
| E-mail: |
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